|
|
Optical Photomasks
Specifications
5 PATTERN GENERATION SYSTEMS
• 11" X 14" Maximum Plate Size
• 6" x 10" Writing Area
• 0.000010" Addressable Resolution
• 0.000015" Absolute Positionable Accuracy
• 2.6 micron Minimum Feature Size
• H-Line, E-Line and G-Line Capability
7 HIGH PRECISION IMAGE REPEATING SYSTEMS
• 2.5" to 8"x 10" Plate Size
• 0.400" x .400" Maximum Die Size (10X)
• 0.800" x .800" Maximum Die Size (5X)
• 6" x 9" Stepping Area, 3" or 5" Reticle Size
• 1.25 micron Minimum Feature Size
• H-Line and E-Line Capability
2 LARGE-AREA IMAGE REPEATING SYSTEMS
• 4"x 4" to 24"x 24"Plate Size
• 4.5"x 4.5" Maximum Die Size
• 18"x 18" Stepping Area
• 1X Projection System
• 10 micron Minimum Feature Size
• H-Line Capability
2 HIGH RESOLUTION REDUCTION CAMERAS
• 10:1, 20:1, 25:1 Reduction Factors
• 0.060" High Resolution Glass Up To 4"x 4"
• 3"x 3" Maximum Image Area
• 0.0005" Minimum Line Widths
|
|
|
